Application Finder
- 8.000.6113Determination of Trace Level Lead (Pb) in Drinking Water Using a Mercury-Free Electrode and a Portable InstrumentAccording to the Requirements of USEPA Lead and Copper Rule
Lead is known to be highly toxic, and lead salts are easily resorbed by humans. Cases of chronic lead poisoning caused by lead metal used in the water piping system are well known. Therefore, the control of drinking water for lead content is of utmost importance. The Lead and Copper Rule (LCR) published by the USEPA (United States Environmental Protection Agency) states an action limit of 15 μg/L lead for drinking water. Using a portable voltammetric instrument, lead can be determined in these concentrations directly at the point of sampling.
- AB-401Installation instruction: Professional CVS systems semiautomated
This Application Bulletin contains installation instructions for semiautomated CVS setups used to measure suppressors, brighteners, and levelers in electroplating baths.
- AB-402Installation instructions for MVA-20: 894 Professional CVS fully automated for CVS determinations
The «MVA-20» is a fully automated system for the determination of suppressor, brightener, and leveler in plating solutions in small sample series.
- AB-403Installation instructions for MVA-21/MVA-23: 894 Professional CVS or 884 Professional VA fully automated for CVS determinations
This Application Bulletin contains the installation instructions for the MVA-21/MVA-23. This is a fully automated system for the determination of suppressors, brighteners, and levelers in electroplating baths.
- AB-420Determination of suppressor with CVS using the calibration technique «smartDT» with dynamic addition volumes
The Application Bulletin describes the determination of suppressor in acid copper baths by smartDT. The determination of suppressor with dilution titration (DT) involves numerous additions with standard solution or sample to reach the evaluation ratio. Usually fixed, equidistant addition volumes are used. With smartDT, variable addition volumes are used that are dynamically calculated by the software. At the beginning, the volumes are bigger. Towards the evaluation ratio, the addition volume becomes smaller to guarantee a good accuracy of the result. The operator defines the first and the smallest addition volume to be used. All volumes in between are calculated by the software considering the progress of the determination. The time saving with smartDT compared to a classic DT with fixed addition volumes can be up to 40%. smartDT is suitable for nonlinear regression and quadratic regression as well as linear interpolation. It can be used for determination of suppressor in acid copper baths as well as in tin and tin-lead baths and works with 1, 2, and 3 mm Pt working electrodes. A 800 Dosino is required for the automatic addition of suppressor standard or sample. The method can also be used in fully automated systems.
- AN-EC-030Electrochemistry of microelectrodes: a comparison with common-size electrodes
In this Application Note, the electrochemical properties of electrodes with a micrometer-size surface area are compared with the electrochemical properties of electrodes with millimeter-size surface area. The comparison is made through cyclic voltammetry in a Fe3+/Fe2+ (ferro/ferri) solution, and the differences in the voltammograms are explained with the different diffusion profiles at the electrode-electrolyte interface.
- AN-PAN-1067Online analysis of organic additives in copper plating process
Monitoring organic additives in copper plating baths is crucial. The 2060 CVS Process Analyzer optimizes copper electroplating by providing precise bath control.
- AN-V-133Suppressor «Copper Gleam 2001 Carrier» (Rohm and Haas) in acid copper bath
Determination of suppressor «Copper GleamTM 2001 Carrier» in acid copper baths by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-134Brightener «Copper Gleam 2001 Additive» (Rohm and Haas) in acid copper bath
Determination of brightener «Copper GleamTM 2001 Additive» in acid copper baths by modified linear approximation technique (MLAT) using cyclic voltammetric stripping (CVS).
- AN-V-135Suppressor «Cupracid BL-CT» (Atotech) in acid copper bath
Determination of suppressor «Cupracid BL-CT» in acid copper baths by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-136Brightener «Cupracid BL» (Atotech) in acid copper bath
Determination of brightener «Cupracid BL» in acid copper baths by linear approximation technique (LAT) using cyclicvoltammetric stripping (CVS).
- AN-V-137Suppressor «Cupraspeed» (Atotech) in acid copper bath
Determination of suppressor «Cupraspeed» in acid copper baths by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-138Brightener «Cupraspeed» (Atotech) in acid copper bath
Determination of brightener «Cupraspeed» in acid copper baths by modified linear approximation technique (MLAT)using cyclic voltammetric stripping (CVS).
- AN-V-141Suppressor «MACuSpec PPR 100 Wetter» Wetter (MacDermid) in acid copper bath
Determination of suppressor «MACuSpecTM PPR 100 Wetter» in acid copper baths by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-142Brightener «MACuSpec PPR 100» (MacDermid) in acid copper bath
Determination of brightener «MACuSpecTM PPR 100 Brightener» in acid copper baths by modified linear approximation technique (MLAT) using cyclic voltammetric stripping (CVS).
- AN-V-143Suppressor «Multibond 100 Part A20» (MacDermid) in acid copper bath
Determination of suppressor «MultiBondTM 100 Part A20» in an acid copper bath by dilution titration (DT) using cyclicvoltammetric stripping (CVS).
- AN-V-144Suppressor «Ronastan TP» (Rohm and Haas) in tin/lead bath
Determination of suppressor «Ronastan TP Additive» in a tin/lead bath by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-145Suppressor «Solderon ST-200 Primary» (Rohm and Haas) in a tin bath
Determination of suppressor «Solderon ST-200 Primary» in a tin bath by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-146Suppressor «InPulse H6» (Atotech) in acid copper bath
Determination of suppressor «InPulse H6» in acid copper baths by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-147Brightener «InPulse H6» (Atotech) in acid copper bath
Determination of brightener «InPulse H6» in acid copper baths by modified linear approximation technique (MLAT) using cyclic pulse voltammetric stripping (CPVS).
- AN-V-155Suppressor «Thrucup EVF-B» (Uyemura) in acid copper bath
Determination of suppressor «Thru-Cup EVF-B» in acid copper baths by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-156Brightener «Thrucup EVF-1A» (Uyemura) in acid copper bath
Determination of brightener «Thru-Cup EVF-1A» in acid copper baths by modified linear approximation technique (MLAT) using cyclic voltammetric stripping (CVS).
- AN-V-157Leveler «Thru-Cup EVF-R» (Uyemura) in acid copper bath
Determination of leveler «Thru-Cup EVF-R» in acid copper baths by response curve technique (RC) using cyclic voltammetric stripping (CVS).
- AN-V-182Suppressor «Top Lucina a-M» (Okuno Chemical Industries) in acid copper bath
Determination of suppressor «Top Lucina α-M» in acid copper baths by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-183Brightener «Top Lucina a-2» (Okuno Chemical Industries) in acid Cu bath
Determination of brightener «Top Lucina α-2» in acid copper baths by modified linear approximation technique (MLAT) using cyclic voltammetric stripping (CVS).
- AN-V-184Leveler «Top Lucina a-3» (Okuno Chemical Industries) in acid Cu bath
Determination of leveler «Top Lucina α-3» in acid copper baths by response curve technique (RC) using cyclic voltammetric stripping (CVS).
- AN-V-202Determination of suppressor in acid copper baths by smartDT
The determination of suppressor with dilution titration (DT) involves numerous additions with standard solution or sample to reach the evaluation ratio. Usually fixed, equidistant addition volumes are used. With smartDT, variable addition volumes are used that are automatically calculated by the software. At the beginning, the volumes are bigger. Towards the evaluation ratio, the addition volume becomes smaller to guarantee a good accuracy of the result. The operator defines the first and the smallest addition volume to be used. All volumes in between are calculated by the software considering the progress of the determination. Using smartDT with intelligent addition volumes, the determination of suppressor can be significantly accelerated with the same or even better accuracy than with the classic DT. The time saving per determination is between 20 and 40%.
- WP-051Automated CVS method development and optimization of multicomponent plating baths
For the past three decades, Cyclic Voltammetric Stripping (CVS) has been the standard practice for analyzing organic additives in electroplating copper baths in the circuit board and wafer plating industries. The variations in the compositions of such baths have created a need for more optimized method development routines. New advancements in the hardware and software protocols for CVS have simplified the overall process of method optimization to a great extent. In this study, the process of method optimization is discussed in conjunction with these protocols.
