Applications

In this article portable Raman spectroscopy as an effective tool for at-line characterization of carbon black is presented. Raman spectroscopic analysis can be an effective test to characterize carbon black material, including the structural order.

Raman spectroscopy is a valuable tool for the characterization of carbon nanomaterials due to its selectivity, speed, and ability to measure samples nondestructively. Carbon materials typically have simple Raman spectra, but they contain a wealth of information about internal microcrystalline structures in peak position, shape, and relative intensity.

The Restriction of Hazardous Substances (RoHS) Directive 2002/95/EC stipulates maximum limits for the hazardous metals cadmium, lead and mercury as well as the hexavalent chromium and the brominated flame retardants in electrical and electronic products. To ensure compliance, reliable analysis methods are required.This poster deals with the wet-chemical determination of trace concentrations of the six RoHS-restricted substances in a wide variety of materials including metals, electrotechnical components, plastics and wires. After sample preparation according to IEC 62321, the metals lead, cadmium and mercury are best determined by anodic stripping voltammetry (ASV) and the flame retardants PBB and PBDE are quantified by direct-injection ion chromatography (IC) using spectrophotometric detection. Chromium(VI) can be determined either by adsorptive stripping voltammetry (AdSV) or IC. Both methods are very sensitive and meet prescribed RoHS limits.

UV/VIS detection is one of the most sensitive detection techniques in trace-level chromatography. Sometimes, however, spectrophotometric detection lacks sensitivity, selectivity or reproducibility and chemical derivatizations are required. By using Metrohm`s rugged and versatile flow-through reactor, single- or multi-step derivatizations can be done fully automatically, in either pre- or post-column mode at any temperature between 25…120 °C. The variable reactor geometry allows to adjust the reactor residence time of the reactants according to derivatization kinetics. The flexibility of the reactor is demonstrated by optimizing four widespread post-column techniques: the relatively slow ninhydrin reaction with amino acids and the fast derivatizations of silicate, bromate and chromate(VI).

Determination of chloride and sulfate in the presence of high nitrate concentrations. Optimization of the chromatographic separation by variation of the temperature and eluent composition.

The metals Cd, Co, Cu, Fe, Ni, Pb, and Zn are determined in the sub-ppb range (limit of detection 0.05 µg/L) by means of stripping voltammetry. The DP-ASV method is used for Cd, Cu, Pb, and Zn whereas Co, Ni, and Fe are determined by means of the DP-CSV method (dimethylglyoxime or catechol complexes).Use of the VA Processor and the sample changer allows automatic determination of the above metal ions in one solution. The method has been specially developed for trace analysis in the manufacture of semiconductor chips based on silicon. It can naturally also be employed successfully in environmental analysis.

This bulletin deals with the automated determination of mixtures of HNO3, HF and H2SiF6 in the range of approximately 200-600 g/L HNO3, 50-160 g/L HF, and 0-185 g/L H2SiF6 using thermometric titration.Etch acid mixtures containing HNO3, HF and H2SiF6 from the etching of silicon substrates can be analyzed in a sequence of two determinations using the 859 Titrotherm. The first determination involves a direct titration with standard c(NaOH) = 2 mol/L, followed by a back titration with c(HCl) = 2 mol/L. This determination yields the H2SiF6 content plus a value for the combined (HNO3+HF) contents. The second determination consists of a titration with c(Al3+) = 0.5 mol/L to determine the HF content. For freshly made up mixtures of HNO3 and HF containing no H2SiF6, a linked two-titration sequence is employed. Results from the two determinations are used by tiamoTM to yield individual results for HNO3, HF and H2SiF6.

Eco Titrators provide the capability to send PC/LIMS reports directly to a PC. This feature is mainly used to transfer data to an external LIMS system or to simply store the data in a digitally on the PC. Additionally, it is possible to control the Eco Titrator by RS232 commands if the connection is set up according to the procedure described below.The data transfer from the Eco Titrator to a PC can be done by a software- or a hardware-based option. Additional accessories are needed for the hardware-based option whereas for the software-based option two additional softwares must be installed. Both solutions are described in this document.

This Application Bulletin contains installation instructions for the MVA-24 CVS setup used to measure suppressors, brighteners, and levelers in plating solutions.

Cleanliness is indispensable in electronics production. Ionic contaminations in particular lead to a drastic worsening of the quality of the printed circuit boards. The present Application Note describes the determination of cations on printed circuit board surfaces. The intelligent Partial Loop Injection Technique (MiPT) used for this purpose permits the determination of cations and anions in the same sample. The determination of the anions is described in AN-S-317.

This Application Note describes the determination of N,N-diethylhydroxylamine (DEHA), triisopropanolamine (TIPA) and a cationic color developing component (CDC) in a developer solution. The analysis is performed on a high-capacity column such as Metrosep C - 250/4.0 with subsequent direct conductivity detection. To reduce the residence time of the strongly retained color developer components, the column flow rate is increased after the elution of the amines.

The EU directive for limiting the use of certain hazardous substances in electrical and electronic devices and IEC 61249-2-21 define limit values for halogen contents in materials that are used in electronics. Metrohm Combustion IC with ion chromatography determination permits precise, rapid and automated halogen determination in raw materials that are used in printed circuit boards according to IEC 61189-2.Keyword: pyrohydrolysis

Hydrogen peroxide is available in different purity grades depending on its use. High purity H2O2 (electronic grade) requires very low contamination levels, e.g., less than 1 μg/L of trimethylamine (TMA). This application describes the determination of trimethylamine in a high-purity H2O2 solution (30%). Analysis is performed using Inline Preconcentration with Matrix Elimination (MiPCT-ME) applying conductivity detection after sequential cation suppression.

Determination of trace levels of cations and amines in hydrogen peroxide is important in quality determination of high-grade semiconductor chemicals. In particular, some manufactures look for 1 ppb trimethylamine or less in hydrogen peroxide samples. Ion chromatography after MiPCT-ME* with conductivity detection after sequential cation suppression is applied.

A reference electrode has a stable and well-defined electrochemical potential (at constant temperature), against which the applied or measured potentials in an electrochemical cell are referred. A good reference electrode is therefore stable and non-polarizable. In other words, the potential of such an electrode will remain stable in the used environment and also upon the passage of a small current. This application note lists the most used reference electrodes, together with their range of use.

Copper is arguably one of the most technologically relevant metals, especially for the semiconductor industry. The deposition process used in this industry is known as the dual-damascene process and it involves the electrodeposition of copper from an acidic cupric compound, in the presence of additives.This Application Note illustrates the use of the Autolab rotating ring disc electrode (RRDE) for the study of electrodeposition of copper and the detection of the Cu+ intermediate.

In this application note, electrochemical impedance spectroscopy (EIS) is used to test a commercial battery connected in two different ways. In the first EIS measurement, the battery is connected in a two-terminal sensing configuration. In the second EIS measurement, the battery is connected in a four-terminal sensing (Kelvin sensing) configuration. The difference in how the leads are connected results in different measured impedance values for the battery.

The determination of heavy metal ions in a solution is one of the most successful application of electrochemistry. In this application note, anodic stripping voltammetry is used to measure the presence of two analytes, in a sample of tap water.

The TSC SW Closed and TSC Battery cells are compact systems designed for measurements on air or moisture-sensitive materials, such as those used in batteries. In this document, two testing procedures are explained. The first procedure is withpotentiostatic cyclic voltammetry (CV), while the second is via electrochemical impedance spectroscopy (EIS).

Capacitors are electronic components necessary for the success of the electronics industry. They have also become essential components of both electric and hybrid vehicles. Electrochemical tests, such as potentiostatic cyclic voltammetry, are used to check the performance of capacitors. VIONIC powered by INTELLO can perform both staircase and linear cyclic voltammetries (CV). This Application Note gives a comparison between the linear and the staircase potentiostatic cyclic voltammetries and highlights the necessity of using the linear CV to best study the performance of capacitors.

In this Application Note, hydrogen permeation experiments are conducted following the procedure described in the ASTM standard G148.

The Devanathan-Stachurski cell (or «H cell») is successfully used to evaluate the permeation of hydrogen through sheets or membranes. As small amounts of hydrogen pass through the sheet or membrane, a very sensitive potentiostat is required for its detection. A study of the hydrogen permeation properties of different iron sheets is discussed in this Application Note while taking the instrumental requirements into account.

In the application note AN-EIS-004 on equivalent circuit models, an overview of the different circuit elements that are used to build an equivalent circuit model was given. After identifying a suitable model for the system under investigation, the next step in the data analysis is estimation of the model parameters. This is done by the non-linear regression of the model to the data. Most impedance systems come with a data-fitting program. In this application note, the way NOVA is uses to fit the data is shown.

In this application note, the advantage of recording the raw time domain data for each individual frequency during an electrochemical impedance measurement is described.

Electrochemical impedance spectroscopy (EIS) is a powerful technique which provides information about the processes occurring at the electrode-electrolyte interface. The data collected with EIS are modeled with a suitable electrical equivalent circuit. The fitting procedure will change the values of the parameters until the mathematical function matches the experimental data within a certain margin of error. In this Application Note, some suggestions are given in order to get acceptable initial parameters and to perform an accurate fitting.

This Application Note presents the Mott-Schottky measurement, an extension of electrochemical impedance spectroscopy (EIS), on a popular semiconducting material.

This Application Note explains how fluoride determination in acid etching baths can be performed with thermometric titration.

Determination of bromide and chloride in photographic developer solutions.

Determination of hydrofluoric acid in mixed acid etchant solutions.

Automated determination of the H2SiF6 and HF contents of industrial grade hexafluorosilicic acid.

This Application Note describes the determination of fluoride in silicon etch solutions with thermometric titration.

Determination of concentrated potassium hydroxide solutions which had been used for the etching of substrates containing silicon.

Determination of the total acids concentration in mixtures of nitric-hydrofluoric acid intended for etching silicon substrates.

Two separate titration sequences are required to analyze the mixture:- titration of the HF content with Al(NO3)3 (the «elpasolite» reaction)- titration of the H2SO4 with BaCl2 followed by titration with NaOH to determine the «total acids» contentThe HF, H2SO4, and «total acids» contents are converted to a HNO3 equivalent, with the HNO3 content found by subtracting the HF and H2SO4 from the «total acids» content.

Thermometric titration can be used for the ready determination of sulfuric acid and phosphoric acid in acid mixtures. An endpoint for each acid appears on the titration curve that can be used to quantify the respective acid.

Thermometric titration is used for the determination of hydrochloric acid and phosphoric acid in acid mixtures. Two endpoints appear on the titration curve that are used for the determination of the two acids.

Thermometric titration is used for the determination of hydrochloric acid and nitric acid in acid baths. The entire acid content is titrated with caustic soda in the initial titration; the hydrochloric acid content is then determined in a second titration using silver nitrate solution.

Thermometric titration is used to determine hydrochloric acid and hydrofluoric acid (hydrogen fluoride) in etching baths containing ethanol and acetonitrile. Two endpoints appear on the titration curve that are used individually for the quantification of the respective acid.

Thermometric titration is used to determine hydrofluoric acid and nitric acid in etching baths containing ethanol and acetonitrile. Two endpoints appear on the titration curve that are used individually for the quantification of the respective acid.

Determination of nitrate in a copper plating bath after conversion of nitrate to ammonium. Direct potentiometric measurement using the NH3-ISE.

Determination of fluoride in a chromium plating bath by direct potentiometry using the F-ISE.

Determination of anions in solder paste after alcoholic extraction using anion chromatography with direct conductivity detection.

In the semiconductor industry, thermoset resins combined with fabric or paper are used as an intermediate layer between substrates of printed circuit boards (PCB). These polymer-based sheets (laminates) are chosen depending on thickness and their thermomechanical and electrical characteristics. Near infrared spectroscopy (NIRS) is a fast, non-destructive and easy-to-use analytical method which allows the measurement of multiple key quality parameters in less than a minute. The following Application Note describes the determination of the transition time of PCB laminates by NIRS, a parameter correlating with the thickness, glass transition temperature, and tensile strength of the material.

Fast and reliable detection of phosphoric, sulfuric, nitric, and hydrofluoric acids with near-infrared spectroscopy in under one minute.

This application note discusses an alternative near-infrared (NIR) spectroscopy method that can reliably determine all parameters within a minute, even in complex acid mixtures.

Determination of citrate, ascorbate, and acetate in photographic developer solution using ion-exclusion chromatography with suppressed conductivity detection.

In an electroless plating bath, the consumed ingredients have to be regularly replenished to ensure an even layer of nickel-phosphorus alloy. This requires online monitoring of the active bath constituents. Parameters to be controlled are pH value (4.5–5.0) as well as nickel (NiSO4 < 10 g/L) and hypophosphite concentration (NaH2PO2: 1–12%). Other measurement options include sulfate, alkalinity, and organic additives (via CVS).

The chemicals used in the manufacture of semiconductors must exhibit an exceptional purity, because even traces of contaminants have a negative effect on electrical properties. For the manufacture of printed circuit boards, the light-sensitive photoresist applied to the substrate (wafer) is exposed to light at defined areas with the aid of a photo template and then developed in a chemical reaction. The developer contains 2.38 to 2.62% tetramethylammonium hydroxide (TMAH) and ensures that the exposed areas can be readily separated from the substrate. The monitoring of the TMAH concentration in the developer solution takes place with a process analyzer from Metrohm Applikon that is configured specially for titration. In addition to this, the analyzer helps with the mixing of the TMAH solutions.

The planarity and smoothness of silicon wafers are fundamental to manufacture optimal semiconductor devices, and Chemical Mechanical Planarization (CMP) is the most common technology used to achieve ultra-flat surfaces. A slurry is used for this purpose, composed of deionized water, a colloidal silicon or alumina liquid dispersion, and hydrogen peroxide, which has to be constantly monitored at all times.Online monitoring of the CMP process is necessary to avoid chemical waste and enhance wafer production yields. Metrohm Process Analytics can measure not only the H2O2 concentration, but also pH, conductivity, and temperature using the multipurpose 2060 Process Analyzer.

Rapid inline monitoring of the major SC1/SC2 bath constituents is possible with reagent-free near-infrared spectroscopy, e.g., the 2060 The NIR-R Analyzer.